Post by ZEISS Semiconductor Manufacturing Technology

At this year’s EUVL Symposium and Source Workshop, experts from across the ecosystem came together to discuss the next steps in lithography scaling – from High‑NA-EUV and emerging Hyper‑NA-EUV technology to advanced source technology and metrology. In this context, our colleague Sebastian Brück shared updates on EUV projection optics, including: 🔹 Recent advancements in EUV projection optics for both established and next-generation lithography platforms 🔹 Continuous improvements in optical performance to support increasingly demanding semiconductor manufacturing requirements 🔹 Key learnings from the development of High-NA-EUV systems and the significant progress achieved so far. He also provided a brief outlook on future directions, including Hyper-NA. 💡 A big thank you to everyone who contributed to the discussions, technical sessions, and supplier showcase. Advancing EUV remains a true team effort across the global ecosystem. 🤝 #teamZEISS #EUV #lithography #semiconductors #innovation