Post by ZEISS Semiconductor Manufacturing Technology

We are excited to be part of the 41st European Mask and Lithography Conference (EMLC 2026), taking place June 22–24 in Jena, Germany – for the very first time in this historic location. Jena is more than a host city. It is the birthplace of ZEISS and a cradle of optical lithography – making this year’s conference especially meaningful for us. Every year, EMLC brings together scientists, researchers, and industry experts from around the world to exchange on the latest developments in mask and lithography technologies and to shape future directions. At EMLC 2026, ZEISS SMT is contributing across multiple dimensions: 🔹Technical presentations and poster contributions in EUV and mask technologies 🔹Active involvement in the program as session chairs 🔹The ZEISS Award for Talents in Photomask Industry, recognizing the Best Student Presentation 🔹A keynote by Dr. Clemens Neuenhahn, Head of ZEISS Semiconductor Mask Solutions: “Quo Vadis EUV Mask Technologies and Ecosystem?” 📅 June 24 | 13:10–13:40 👉 Explore the full conference program here: https://lnkd.in/d68J4B3 We are looking forward to inspiring discussions, new perspectives, and connecting with the global lithography community. #EMLC2026 #teamZEISS #masksolutions #EUV #lithography