Post by scia Systems GmbH

AMTC has purchased a new cluster system from scia Systems, with strategic support from Tekscend Photomask Corp..   The scia Cluster 215 comprises two processing chambers:   ☑️ the scia Mill system is equipped with a broad ion beam source supporting both Ion Beam Etching (#IBE) and Reactive or Chemically Assisted Ion Beam Etching (#RIBE / #CAIBE)   ☑️ the scia Trim system uses a focused broad ion beam with a fine focal point for highly precise trimming of substrates   More Information here: https://lnkd.in/dKMUMDKE © Picture: Advanced Mask Technology Center