Post by Jay Yu

We're proud to announce that Laser Isotope Separation Technologies (LIS Technologies Inc.) breaks into the Stable Isotopes Industry. These critical isotopes are required to enhance the performance of next-generation chips for #AI and quantum computing, or potential medical isotopes that can drive healthcare breakthroughs. Our Tier 1 Recruitment brought us a technical expert and seasoned professional, "Laser Isotope Separation Technologies (LIS Technologies Inc.) Bolsters its Technical Team with the addition of Prominent Researcher and Engineer Lukasz Urbanski, Ph.D., to Lead its Stable Isotope Laser Program" #LaserEnrichment #NuclearFuel #HALEU #LEU #Uranium #SemiConductor #Chips Dr. Lukasz Urbanski is a seasoned technologist, bringing 12 years of experience in the semiconductor industry, specializing in high-power CO2 laser systems for Extreme Ultraviolet (EUV) lithography. As a High-Power Laser Systems Architect at ASML Research, he led the development of next-generation drive lasers, critical components for laser-produced plasma in high-volume manufacturing EUV lithography systems. His work focused on scaling laser power and efficiency while reducing technology costs, resulting in multiple world records in power output, stability, repetition rate, & system architecture. “It is a joy to take on this role with LIS Technologies and spearhead the creation of its Stable Isotope Laser Program,” said Lukasz Urbanski, Ph.D., Stable Isotope Laser Program Director of LIS Technologies Inc. “There is a major opportunity in pursuing the development of stable isotopes, and later medical isotopes, that the Company has seen fit to explore and I am delighted to lend my expertise and help to expand the possibilities of what CRISLA can achieve.” Dr. Urbanski began his career in EUV research as a graduate student at the National Science Foundation (NSF) Engineering Research Center for EUV Science & Technology, where he advanced to a postdoctoral researcher role. During this time, he also contributed to research at the Center for Functional Nanomaterials at Brookhaven National Laboratory. Before transitioning to academia and industry, he served as a Platoon Commander in the Polish Armed Forces after graduating from the Military University of Technology with a Master’s degree in Electrical Engineering. He received his Ph.D. in Electrical Engineering from Colorado State University with a focus on EUV Lasers, Nanopatterning, Nanofabrication, EUV Lithography. Prior to the architect role at ASML, Dr. Urbanski served as a Staff Systems Engineer, where he acted as a key interface between Research, Engineering, and Product Development teams. ... His contributions spanned the entire product lifecycle, from concept and design through implementation, ensuring technical alignment and performance optimization across teams. https://lnkd.in/erAzNmyy