Post by imec

Press release - imec installs the world’s most advanced High NA EUV system Today, imec announces the arrival of the ASML EXE:5200, the world’s most advanced High NA EUV lithography system, in its 300mm cleanroom in Leuven. Directly integrated with state-of-the-art patterning and metrology equipment, the system will accelerate learning cycles and enable imec and its global partner ecosystem to unlock the performance required for sub-2nm logic and high-density memory technologies, supporting the continued scaling of AI and high-performance computing. Luc Van den hove, President and CEO of imec: “With this strategic capability, imec reinforces its central role in launching the industry into the ångström era. The tool is also set to play a pivotal role in solidifying Europe’s position as a leader in advanced semiconductor R&D in the decades to come.” Read the full press release: https://lnkd.in/e8QKMtSD #AngstromEra #HighNA #EUV