Post by Helmholtz-Zentrum Berlin

𝗦𝗰𝗶𝗲𝗻𝗰𝗲 𝗡𝗲𝘄𝘀: 𝗘𝗱𝗶𝘁𝗼𝗿’𝘀 𝗣𝗶𝗰𝗸 𝘀𝘁𝘂𝗱𝘆 𝗽𝘂𝗯𝗹𝗶𝘀𝗵𝗲𝗱 𝗶𝗻 𝗔𝗽𝗽𝗹𝗶𝗲𝗱 𝗣𝗵𝘆𝘀𝗶𝗰𝘀 𝗟𝗲𝘁𝘁𝗲𝗿𝘀 A German–Israeli research team led by Dr. Andreas Furchner has demonstrated how imaging ellipsometry enables non-destructive characterisation and quality control of microstructured MXene thin films during device fabrication. The authors used two complementary ellipsometry approaches for precise, multi-scale access to key material properties. The work positions imaging ellipsometry as a powerful platform for monitoring thin-film uniformity, device integrity, and functionality throughout processing, including critical lithographic steps.