Post by Entegris

We’re excited to share how Entegris is supporting semiconductor manufacturers in advancing yield, reliability and process control at SPCC 2026. Join us during the poster session to explore technical research developed around real fab challenges. Each study focuses on practical solutions for advanced nodes, helping customers strengthen particle control, extend filter lifetime and protect critical wet processes. 📅 May 19, 6:30–8:00 PM 📍 DIW contamination control using advanced 2-in-1 filtration 📍 Nanoscale filter lifetime behavior below 50 nm 📍 Reducing defectivity in CFET wet clean processes 📅 May 20 📍 Characterization of Particle Filtration Solutions in a Weak Acid Don’t miss this technical presentation co-presented by Siddarth Sampath, introducing a novel image- based approach to nanoparticle filtration analysis. The session offers new insights into filtration performance in weak acid chemistries and next generation semiconductor manufacturing environments. 📍 Wet etch solutions development for advanced node devices This technical presentation by Steven Kraft explores the expanding role of wet etch in advanced node device integration. The session highlights key performance drivers for molybdenum, silicon germanium, and highly selective nitride etching, and shares how digitally driven research and deep integration expertise enable integration customized solutions for leading edge 3D NAND, DRAM, and logic technologies. We look forward to connecting and sharing ideas with our customers and partners. #SPCC2026 #AdvancedFiltration #SemiconductorManufacturing