Post by Entegris

Advancing EUV lithography takes more than one breakthrough. It takes an ecosystem moving forward together. Entegris and JSR Corporation, parent of Inpria, have entered a non-exclusive cross licensing agreement to support EUV lithography and metal oxide photoresist adoption for next generation semiconductor manufacturing, where AI, high performance computing and advanced logic demand purity, performance and reliability at every step. “As the industry moves to smaller nodes, materials innovation, performance, purity, and reliability become inseparable,” said Olivier Blachier SVP Chief Strategy and Innovation Officer at Entegris. “This cross licensing reflects how innovation in semiconductors increasingly happens across the ecosystem, helping customers as they adopt next generation lithography with greater confidence.” Bringing together complementary strengths across the semiconductor materials stack, this collaboration supports more consistent EUV performance at advanced nodes. By combining leadership in metal oxide photoresist with Entegris expertise in contamination control, advanced filtration and materials handling, this collaboration helps customers scale high volume manufacturing, reduce risk, and bring leading edge technologies to market with confidence. 🔗 Learn more in the joint press release https://lnkd.in/eUSMpqGW #EUVLithography #MetalOxideResist #Photoresist #SemiconductorMaterials #AdvancedNodes #AIChips