Yunfeng Lu

Process Development Engineer MGTS

Lehi, Utah, United States

About

My expertise - Integration/Device/Problem Solving/Team Working About me - I enjoy playing soccer, tennis, fishing outside of work. I love spending time with my family outdoors

Experience

  • Process Development Engineer MGTS at Texas Instruments
    Oct 2021 - Present · 4 yrs 9 mos

  • Principal Device Engineer at Micron Technology
    Oct 2019 - Oct 2021 · 2 yrs 1 mo

    • Working closely with Process team, Integration, Product team and BE testing to improve 3DxP Endurance/Reliability

  • IM Flash Technologies (12 yrs 9 mos)
    • Device Engineer
      Jan 2011 - Oct 2019 · 8 yrs 10 mos

      • Optimize various technology nodes in collaboration with PI sustaining teams • Lead a cross-functional focus team of 10+ engineers, improved 20 nm NAND yield to be above mature yield (from 87% to 91%), and increased product lifetime by 2X (30,000 cycles qualified) • Won Intel Division Recognition Award due to tremendous contributions to Intel’s success, first time ever awarded to outside candidates by Intel • Coordinated a global focus team of 10+ engineers, eliminated probe fail due to X-ingot non-uniformity, and increased sub-20 nm NAND yield by 1.7% • Took on-line course of “Advanced MOS Device” from Arizona State University • Advancing the current and legacy technology nodes in collaboration with PI sustaining teams. • Working closely with YE, process groups, and PE to improve yield and address reliability issues. • Communicating between parent company Product Engineering teams to ensure the success of Fab 2 projects. • Monitoring probe data, parametric data, and proactively engaging in the design and evaluation of experiments to optimize designated part type/process node. • Responsible for incoming Silicon quality - Working closely with all Silicon vendor to identify/solve substrate silicon related yield/device issues

    • Process Integration Engineer
      Apr 2008 - Jan 2011 · 2 yrs 10 mos

      • Administered the 20 nm NAND Wordline module in a high volume manufacturing (HVM) environment • Identified and fixed 20 nm NAND technology problems improving yield by 15% • Determined the root-cause of Wordline CD mismatch, ensuring 100% successful technology transfer from R&D

    • Photo Engineer
      Feb 2007 - Mar 2008 · 1 yr 2 mos

      Photo Process Engineer