Greater Boston
Specializing in thin film deposition (especially III-V AlN and AlScN) for both growth quality and stress compensation. Wide expertise in front end of line (FEOL) processes including wet/dry etching and photolithography, and characterization including SEM, EDX, and ellipsometry. Experienced in teaching both practical tool usage and theory of fabrication.
Oversaw process development of in-house III-V AlN and AlScN deposition for several doctoral students’ projects, focusing on technologies such as PMUT, CMR, and other resonator technologies. Provided technical support for fabrication and characterization as well as condensed literature reviews for students to aid in their research.
Designed, fabricated, and characterized stress gradient insensitive AlN and Ru MEMS switch for use in a low average power RF wake-up receiver. Developed and qualified multiple front end of the line MEMS processes, including photolithography, dry/wet etching, and specialized thin film deposition processes. Trained, managed, and mentored colleagues and undergraduate students on photolithography and various micro/nano-fabrication processes and numerical analysis.
Directly assisted research center director with operation of cleanroom facility, including MEMS and CMOS front end of line tool maintenance, process protocol development and tool SOPs, as well as training university users in operation of various tools, equipment, and processes.