Jena, Thuringia, Germany
optiX fab GmbH was founded as a Fraunhofer IOF spin-off on December 17, 2012. Located in Jena, the City of Light, optiX fab designs, develops and fabricates EUV illumination and collector optics and coats EUV imaging optics. optiX fab is currently supplying chipmakers, EUV tool and source manufacturers as well as institutes, universities, synchrotron beamlines and EUV research consortia worldwide with customized multilayer and grazing incidence optics for EUV lithography applications at 13.5 nm and the entire XUV and soft X-ray spectral range from 1 to 100 nm (10 eV to 1 keV).