Netherlands
EUV customer imaging
Manufactoring Integration sequence architect
Application engineer responsible for a parallel electron beam lithography system at CEA-Leti for MAPPER Lithography. Tasks include implementation of system upgrades, application development, and leading customer support.
Various R&D projects within the Projection Optics team. Furthermore; as a module owner of the projection lens responsible for field support, quality control, and implementation of design and assembly improvements.
At wavelengths much smaller than that of visible light the manipulation of electromagnetic radiation requires special reflective optics, usually consisting of stacks of altering thin films. Such optical elements are critical for computer chip production by optical lithography operating at Extreme Ultraviolet (EUV). This research project involved the growth conditions of nanometer scale thin-films and EUV reflective multilayer optics. General objective was the identification and experimental verification of control parameters for the morphology of surfaces and interfaces. The main characterization techniques that were used are EUV and X-ray reflectometry, scanning probe microscopy (AFM and STM), and XPS. Merits of the work include conventional planar Mo/Si multilayers with improved interface smoothness (i.e. optical performance gain), and demonstration of an entirely new multilayer element featuring a 3-dimentional patterned structure that can be applied as optical filter. My PhD thesis entitled “Ion-enhanced growth in planar and structured Mo/Si multilayers” was successfully defended at Twente University on the 13th of December 2011.