Saint-Martin-d’Hères, Auvergne-Rhône-Alpes, France
Transforming semiconductor innovation into scalable, high-impact manufacturing solutions. Engineering leader with 25+ years in semiconductor process development and equipment engineering, advancing technology nodes and driving process innovations. Expertise in ion implantation, thin film deposition (PVD, PECVD, CVD), epitaxial growth, plasma immersion processing, and inline metrology. Skilled at bridging R&D with manufacturing, optimizing integration flows, detailed materials characterization, and solving complex process challenges. Passionate about operational excellence, collaboration, and mentoring talent, with a proven track record of delivering results through technical expertise and cross-functional teamwork.
Leading Implant and Epi Process development teams Managing people and projects in analog and mixed signal applications.
Amorphous Thin Film Deposition Focusing on hard mask film deposition using PECVD and CVD of silicon and carbon. Application space targeting ILD and spacer materials for advanced node EUV patterning and isolation applications.
Ion Implant technology, Plasma process technology and applications, Process Integration and development. Integrated experiments across multiple module segments. Materials modification process flow development enabling gate formation.
Owned Focused Ion Beam Lab Tool operations and maintenance and project coordination.
Created and Ceramics graduate lab course. Projects include furnace sintering of various ceramic structures and glasses. Students analysed the fabricated materials with optical and scanning electron microscopes.