Lukasz Urbanski

Laser & Optical Systems Engineering Manager

Oak Ridge, Tennessee, United States

About

-Systems Engineering -High Power Laser Technology -Laser Isotope Separation -Extreme Ultraviolet Lithography -Laser Produced Plasmas -Laser optics and interferometry -Wavefront sensing -Soft X-Ray/EUV Lasers

Experience

  • Laser Isotope Separation Technologies (LIS Technologies Inc.) (On-site)
    • Laser & Optical Systems Engineering Manager
      Aug 2025 - Present · 11 mos

    • Director: Stable Isotope Laser Program
      Apr 2025 - Sep 2025 · 6 mos

  • ASML (12 yrs)
    • High Power Laser Systems Architect for EUV Source Technology Development
      Aug 2022 - Apr 2025 · 2 yrs 9 mos

      Development of next generation high power drive laser for HVM EUV lithography light source.

    • Staff Systems Engineer
      Mar 2016 - Dec 2022 · 6 yrs 10 mos

    • Sr Enigneer
      May 2013 - Mar 2016 · 2 yrs 11 mos

  • Postdoctoral Fellow at Engineering Research Center for EUV Science and Technology
    Dec 2012 - May 2013 · 6 mos

  • Guest Researcher at Brookhaven National Laboratory
    Apr 2010 - May 2013 · 3 yrs 2 mos

    Center for Functional Nanomaterials

  • Graduate Assistant at Colorado State University
    Jan 2008 - Dec 2012 · 5 yrs

    Extreme Ultraviolet Lithography. Nanotechnology, Coherent imaging schemes for nano-patterning. Nano-pattern metalization.