Oak Ridge, Tennessee, United States
-Systems Engineering -High Power Laser Technology -Laser Isotope Separation -Extreme Ultraviolet Lithography -Laser Produced Plasmas -Laser optics and interferometry -Wavefront sensing -Soft X-Ray/EUV Lasers
Development of next generation high power drive laser for HVM EUV lithography light source.
Center for Functional Nanomaterials
Extreme Ultraviolet Lithography. Nanotechnology, Coherent imaging schemes for nano-patterning. Nano-pattern metalization.