Dresden, Saxony, Germany
Jonas Sundqvist received his PhD in inorganic chemistry from Uppsala University, Department for Materials Chemistry at The Ångström Laboratory in 2003 where he developed ALD and CVD processes for metal oxide ALD and CVD processes using metal iodides. In 2003 he joined Infineon Memory Development Centre (MDC) as a process engineer for the development of high-k and metal nitride ALD processes. Later at Qimonda (2006) he was a member of the Materials Management team for precursor procurement and acquisition with special focus on ALD precursors for DRAM development and production. In 2009 he joined Fraunhofer Center Nanoelectronic Technologies (CNT) as an expert for thin film deposition with special focus on high-k dielectrics and electrode materials for DRAM, eDRAM, BEOL MIM Cap and HKMG technologies. In 2010 he founded ALD Lab Dresden together with TU Dresden and in 2013 he became Group Leader of High-k Devices Group at Fraunhofer CNT which at the same time became a business unit of Fraunhofer IPMS. In 2014 Jonas Sundqvist founded BALD Engineering, an independent Networking Platform for ALD. In 2015 he spent at Lund University as Laboratory operations manager leading the day-to-day work of Lund Nano Lab, supervising the daily lab activity and taking responsibility of the main infrastructure of Lund Nano Lab. In 2017 he and co-workers from Nano Lund co-founded ALIX Labs AB - a start-up for self-aligned nanopatterning technology. and since 2021 he is CEO. 2015-2020 Jonas was Group Leader at The Fraunhofer IKTS Thin Film Technology Group. Since 2015, he is a Senior Technology Analyst at TECHCET CA LLC for ALD/CVD Precursor and Specialty Electronic Gases, now at full time. Since May 2021 he is Adjunct Senior Lecturer in Inorganic Chemistry at Linköping University, Sweden. Jonas Sundqvist has over 20 years of experience, holds 10 patents, and authored or co-authored more than 30 publications in the fields of ALD and CVD process development. He is Conference Co-Chair for the Annual TECHCET/CMCFabs Critical Materials Conference and EFDS ALD For Industry.
AlixLabs AB provides an ALE-based method of manufacturing nanostructures with a characteristic size below 20 nm. This is a new method of nanostructure fabrication using the atomic layer etching process, which is inherently a damage-free etch process. The recently discovered etching process selectivity to inclined surfaces can be used as a mask and in this way walls of tapered structures. The inclined surfaces can be readily fabricated by e.g. dry etching or epitaxial growth and will provide masking during the atomic layer etching process. This process, therefore, provides access to the fabrication of extremely small structures in a very precise and efficient way.
Adjunct Asocciate Professor in Inorganic Chemistry at the Department of Physics, Chemistry and Biology (IFM), Linköping University, Sweden. The Henrik Pedersen research group at Linköping University is working on chemical vapour deposition (CVD) with the aim to develop better CVD routes to, primarily, electronic materials. One of the most important methods to deposit thin films is CVD, which uses chemical reactions between precursor molecules containing the atoms needed for the film. In our work to develop better CVD routes, we develop new precursor molecules, experiment with new ways of using plasma discharges in CVD, and explore various time-resolved CVD approaches and we perform computational studies of CVD gas phase- and surface chemistry.
Senior Technology Analyst at Techcet Group, LLC. for ALD/CVD Precursors & Electronic Gases. TECHCET is a Technology Focused Materials Market Research and Consulting Company Specialized in Process Materials Markets, Supply Chain, and Technology Trends Analysis for Semiconductor, Display, Solar/PV, and LED Markets.
The European Society of Thin Films (EFDS) is a non-profit organisation active in the industrial field of thin-film technologies. The office is in Dresden – right at the heart of the European semiconductor industry and a major centre of vacuum equipment manufacturing. The EFDS is represented by their member companies, institutions and individuals (201 members as at November 2018) and by nine Executive Committee members, many members of the Advisory Board and expert committees, one national co-ordinating agent and four office staff.
Consulting, training, blogging, networking and spreading news and information about ALD - Atomic Layer Deposition BALD Engineering - Born in Finland, Born to ALD The worlds leading news blog on ALD : http://www.blog.baldengineering.com/