Leuven, Flemish Region, Belgium
head of the MIDA department (100+ FTE) - Materials & Interfaces, Deposition & Analysis. Responsible for the research and development of new materials and deposition processes used in advanced Si process flows in the 300mm pilot line. Covering the ALD, CVD, PVD, EPI toolset as well as lab tools for material screening such as PLD, MBE.
group lead of the thin film scientific group, responsible for the thin film material research and ALD, PVD, CVD process development in imec's 300mm pilot line serving advanced logic and memory applications
technical lead PVD thin film and stack development for imec's MRAM, Spin Logic, and Superconducting Quantum Computing research programs. Leading the PVD film and material development for bilateral DoD projects in the field of Emerging Memory applications. Team lead of the Magnetic Thin Film and Tunnel Junction (MATT) team.
Atomic Layer Deposition process development for CMOS applications, with focus on high-k oxides and metals for the gate stack.