Veldhoven, North Brabant, Netherlands
Be a light, not a judge. Be a model, not a critic. Be part of the solution, not of the problem." Stephen R. Covey . I work in a cutting edge environment where "unbeatable borders" are passed regularly. I truely believe that cooperation, collaboration, interdependency, teamwork, listening and many other so called 'soft' skills are key to sustainable success. Simplicity beats complexity, every problem - every challenge - has a simplifiable character which enables us to overcome those hurdles.
As Release Train Engineer (RTE) I further grow as a servant leader, agile release train (ART) coach facilitating ART events and processes, and supporting teams in delivering value.
As imaging performance EUV we drive, assess, improve and validate one of the core drivers of lithography. Our ownership starts at the current EUV machines, both in the field and in production and ends at the newest upcoming generation - the new EUV high NA platform!
D&E EUV Lithography Imaging Performance