San Francisco Bay Area
• ALD/MLD, CVD thin film deposition / coating techniques. • Expert in thermal and plasma Metal Oxide, and metal thin film deposition • Strong plasma process skills on IDCCP, DCCP and microwave • Computational chemistry. Applied first principles simulations for chemical reactions and precursors screening for deposition process such as ALD and MLD • Lithium ion battery development on Silicon composite anode and Li-metal anode surface stabilization •Thin film deposition techniques for the Microelectromechanical systems (MEMS) sensor development • Proficient in various characterization techniques: Fourier-transform infrared spectroscopy (FTIR), Scanning Electron Microscope (SEM), X-ray Photoelectron Spectroscopy (XPS) and Transmission Electron Microscopes (TEM), Electrochemical Impedance Spectroscopy (EIS)
• Executed process development across multiple projects, including metal oxide High-K for FEOL, and advanced metal processes for MOL and BEOL applications; shared technical expertise and trained engineers in film measurement techniques and troubleshooting. • Designed and executed complex DOE experiments for next-generation nodes; evaluated multi-wafer thermal and plasma tools, meeting and exceeding customer requirements by achieving on-spec tool startup and process qualification on schedule. • Developed expertise in advanced thin film deposition processes, including Plasma ALD and CVD with IDCCP, DCCP, and Microwave technologies, ensuring consistent film quality and process reliability. • Recognized with the Employee Excellence Award (Q1 2024) for outstanding performance in process innovation and cross-team collaboration. • Collaborated directly with customers to resolve complex process engineering challenges, providing innovative solutions with limited supervision.
• Performed research on application of ALD/MLD for Li-ion battery in Prof Stacey Bent and Prof Yi Cui research groups with prestigious TomKat postdoc fellowship. • Developed novel organic-inorganic protection layer for electrodes using ALD/MLD. This novel method can contribute to 33% improvement for Si based battery cell specific capacity in Li-ion battery • Hands on ALD/MLD thin film precursors screening, design and depositions, hands on Li-ion and Li-metal coin cells fabrication, performance and characterizations. Hands-on slurry electrode printing TomKat Postdoctoral Fellow Department of Chemical Engineering Bent Group - Stanford University
• Performed research on thin film deposition techniques for MEMS sensors development • Analyzed and investigated the size of the market both in volume and in value.
Industry mentors: Dr. Emer Ward, Dr. Sabine Cahill and Dr. Ruairi O'Kane Successfully finished 4 years collaboration project between Henkel R&D and Tyndall National Institute on acrylate-based thin film deposition with atomic / molecular layer deposition techniques.
Supervisors: Dr. Simon Elliott and Dr. Ian Povey This is a collaborative project between Tyndall National Institute and Henkel Ireland Ltd, co-funded by the Irish Research Council and Henkel. Hybrid organic/inorganic thin film materials have various potential applications because they combine the distinct properties of organic and inorganic components, e.g. flexibility plus conductivity. A high level of stability and quality of these films needs to be achieved to access these distinct properties and this depends on proper thin film deposition technology. Molecular layer deposition (MLD) is a promising method to deposit high-quality thin films composed of organic and inorganic components.