Leuven, Flemish Region, Belgium
Development of electrodeposition processes for IMEC's 3D program (focusing on Through Silicon Vias (TSVs)) and metallization processes for Solar applications.
Wet-chemical etching of silicon is used in various industrial processes, e.g. in the production of MEMS (micro-electromechanical systems). The focus of the project was on the comparison of the (electro)chemistry of various crystallographic surfaces of silicon and gaining a better understanding. An important factor is the influence of additives, such as alcohols or oxidizing agents, which have profound effects on the (electro)chemistry and morphology of the various crystal surfaces. By understanding these various influences on the etching process, a better control and reproducibility of the etching process can be achieved, which is pivotal when features are produced with nanometer-scale dimensions.