Eindhoven, North Brabant, Netherlands
Engineer in the semiconductor industry with a PhD from the Universiteit of Twente and a background in physics and optics. Lithography imaging and mask expert, driving developments for emerging EUV mask technologies.
Driving developments for EUV reticle technologies like high-k absorber masks and phase shift masks. Imaging impact for lithography is investigated through EM simulations.
We employ an integrated Raman microscope in a dualbeam focused ion beam – scanning electron microscope (FIB-SEM) at the MESA+ institute for nanotechnology. This system enables detailed optical spectroscopic material analysis combined with correlative high resolution electron microscopy imaging. Furthermore material processing capabilities are enabled with FIB milling, the effects are analysed on a chemical specific level with the correlative Raman microscope. The integrated light and electron microscope is applied for the quantitative analysis of plasmonic nanostructures. The effect of the surface morphology, analysed with SEM, on the plasmonic field enhancement is probed with correlative quantitative Raman microscopy. Further applications are investigated in the fields of material and biological sciences including graphene, semiconductor materials, and biological cells.
Further developments on a Shaped Coherent Anti-Stokes Raman Scattering system. Active shaping of the excitation light enables an enhancement of contrast in CARS microscopy. This enables microscopic imaging with an increased specificity and selectivity, and rejection of the signal background.