Greater Dresden Area
In 1985 I started my academic studies at the University of Giessen in Applied Physics, where I achieved a PhD in the field of high temperature superconductive flux-flow devices in 1995. Since 1991 Iworked as a scientific staff member at the Institute of thin film and ion technology at the Research Center in Juelich. In collaboration with Siemens I was responsible for the deposition of large area high temperature superconducting thick films for resistive current limiter applications in power plants. In 1998 I joined the semiconductor business with Infineon technologies in Munich. After a short term delegation to Altis (Corbeil Essonnne, France) I changed to Infineon Technologies Dresden. As lithography principal I am a member of the technical ladder. My main focus at the moment is the development of lithography processes with respect to material and tools, supporting process- and tool roadmaps, as well as technical leadership. In addition I am leading a small group of engineers within the Dresden lithography department. I am also involved in problem solving methods where I am continuously acting as a 8d moderator.