Buffalo, New York, United States
Material scientist/engineer with interests in the synthesis and characterization of low-dimensional quantum materials, optical measurement via Raman spectroscopy, and the growth mechanisms of room-temperature oxide formation on metallic copper surfaces
Material Analytical Services Group: Cardiac Rhythm Management and Neuromodulation Site radiation safety officer
Evaluate novel cooling solutions for high-performance computing and data center thermal management with a focus on reducing ecosystem impact
Organized and maintained electronic reporting platforms and financial data to ensure accurate tracking of product popularity Compiled and sorted financial data to ensure accuracy and payment of vendors in a swift manner
Researcher under the advisement of Prof. Junghyun Cho in collaboration with IBM gathering data on surface contributions in Cu/SiO2 hybrid bonding in hopes of maintaining Moore’s law scaling through 3D integration of wafers without the use of microbumps. Investigated factors include measurement of chip warpage, identification of an unknown protective film and establishment of a unique and reliable optical signature of said film that may be measured both via Raman spectroscopy and Fourier Transform Infrared spectroscopy. Said signature was then used to evaluate surface preparation procedures primarily through the investigation of two different protective film removal techniques. A superior method for protective layer removal was subsequently identified. Additional efforts included the time-dependent evolution of copper oxidization on the metallic bonding pads to establish an efficient timeline for bonding prior to significant oxide formation. It was concluded that bonding should ideally occur within 10 minutes post-surface activation through Argon plasma bombardment.
Researcher exploring chemical vapor deposition synthesis of 2D transition metal dichalcogenides and working to optimize growth of WSe2 for applications in quantum computing and quantum information science. Material stoichiometry, phase and a low defect density have been confirmed via X-ray photoelectron spectroscopy. Primary measurement regards optical signatures measured through Raman and photoluminescent (PL) spectroscopy. The evolution of Raman signatures and PL intensity was studied with respect to increasing dimensionality (i.e., increasing layers) to reveal novel peaks appearing in few-layered WSe2 systems as well as confirm the usefulness of PL as a reliable indicator of atomic thickness. Low-temperature spectroscopic measurements also allowed for the measurement of the neutral ground state (A) and bound state (B) excitonic emissions as well as the measurement of three-fermion composite trions.
Analyzed machine failure and ensured quality control of spectroradiometers per NIST standards. Designed and performed experiments to determine machine sensitivity to temperature, operation consitions, source stability and the transfer calibration process. Authored internal company reports. Production experience in RFID assembly.