The Hague, South Holland, Netherlands
Alessandro Polo obtained his master degree in Physics with cum laude from University of Turin, Italy in 2008. During his master thesis he worked for one year in CRF (Centre Research Fiat, Orbassano, Italy) on the development of a mathematical model describing light scattering from rough surfaces applied to human vision. After his graduation he continued to work until 2009 in CRF on application of photometry and colorimetry, in particular on the optimization of high efficiency optical solution for interior and exterior lighting based on LED sources. In 2010 he joined the Optics Research Group in Delft as a PhD student in the “Pieken in de Delta” program. His research was on the development of an adaptive optics concept for the next generation of EUV Lithography scanners. He obtained his PhD degree in February 2014. Since January 2014 he joined ASML BV research in the group of Sensor Metrology and Control (SMC), working on wafer alignment sensors topics.
Adaptive Optics for EUV Lithography
Interior and exterior lighting design based on LED sources. Light scattering from rough surface. Photo-colorimetric characterization of sources and materials.